
Xuzhou Bokang Information Chemicals
Industrialized manufacturer of photoresist monomers.
Date | Investors | Amount | Round |
---|---|---|---|
investor | €0.0 | round | |
investor | €0.0 | round | |
investor | €0.0 | round | |
investor investor | €0.0 | round | |
investor | €0.0 | round | |
* | CNY600m Valuation: CNY7.0b | Late VC | |
Total Funding | 000k |
Related Content
Xuzhou Bokang Information Chemicals Co., Ltd. operates as a pivotal entity in China's semiconductor materials sector, specializing in the research, development, production, and sales of high-end photoresists and their core components. Founded in March 2010 by Fu Zhiwei, the company was born from his transition from the pharmaceutical industry to advanced electronic chemicals. Fu, a graduate of Nanjing University's biopharmaceutical program, identified the potential of photoresist materials while working in Shanghai and established his first company, Shanghai Bokang Fine Chemical Co., Ltd., in 2007. To scale up production, he returned to his hometown and founded Xuzhou Bokang.
The company's business model is centered on vertical integration, covering the entire supply chain from photoresist monomers and resins to the final photoresist products. This strategy is designed to create a self-sufficient and controllable domestic supply chain for critical semiconductor manufacturing materials. Xuzhou Bokang serves over 100 clients, primarily domestic semiconductor manufacturing enterprises, including major integrated circuit (IC) fabricators. Its revenue is generated through the direct sale of these specialized chemical products. The firm has garnered significant investment from prominent entities, including a notable financing round of over 600 million RMB to expand R&D and production capacity.
Xuzhou Bokang's product portfolio is comprehensive, encompassing a wide array of photoresists such as ArF (193nm), KrF (248nm), I-line, G-line, and electron beam photoresists. These materials are essential for the photolithography process in fabricating integrated circuits. The company has successfully developed over 40 mid-to-high-end photoresist product series. A key achievement includes the development and small-quantity supply of ArF photoresist, a critical material for advanced semiconductor nodes, to memory chip manufacturers. The company operates a major production base in Pizhou, Jiangsu Province, capable of producing 1,100 tons of photoresist materials and 10,000 tons of electronic-grade solvents annually, alongside a 5,000-square-meter R&D center in Shanghai equipped with advanced lithography and testing equipment.
Keywords: photoresist, semiconductor materials, electronic chemicals, lithography materials, ArF photoresist, KrF photoresist, photoresist monomer, photoresist resin, Fu Zhiwei, integrated circuit manufacturing, chemical supplier, semiconductor supply chain, I-line photoresist, electron beam resist, advanced materials, fine chemicals, Chinese semiconductor, high-purity chemicals, photolithography, wafer fabrication