Shanghai Bitong Semiconductor Energy Technology

Shanghai Bitong Semiconductor Energy Technology Co., Ltd. is a high-tech enterprise specializing in the research, development, and manufacturing of thin-film deposition equipment for the semiconductor industry. Founded in November 2008, the company is headquartered in Zhangjiang Science City, Shanghai, with a subsidiary, Suzhou Bitong, located in the Taicang Sino-German Industrial Park. The firm has established itself as a key domestic supplier of equipment for 8 to 12-inch semiconductor manufacturing processes.

The company's core product offerings include Plasma-Enhanced Chemical Vapor Deposition (PECVD), Physical Vapor Deposition (PVD), and Atomic Layer Deposition (ALD) equipment. These systems are crucial for creating the thin-film layers that form integrated circuits. Betone Technology's 300mm chemical vapor deposition equipment, developed with self-designed control software, aims to enhance production efficiency and fill a gap in the domestic equipment market. The company serves clients in the integrated circuit manufacturing sector.

Since its inception, Bitong Semiconductor has received numerous accolades, including being named a High-tech Enterprise and a Shanghai Strategic Emerging Industry Project Undertaking Enterprise. The company holds a significant intellectual property portfolio, with 129 patents and software copyrights, including 40 invention patents. A significant milestone was achieved in November 2023, when the company completed a Series C financing round of nearly CNY 500 million. This funding round was supported by a consortium of investors, including Juntong Capital, Grand Yangtze Capital, SAIF Investment Fund, and others, which will be used to enhance R&D, talent acquisition, and industrial layout acceleration.

The research and development team at Bitong Semiconductor is composed of several returnee doctoral experts and senior R&D personnel with extensive experience in the semiconductor equipment field.

Keywords: semiconductor equipment, thin-film deposition, PECVD, PVD, ALD, integrated circuits, chemical vapor deposition, physical vapor deposition, wafer fabrication equipment, semiconductor manufacturing, high-tech enterprise, circuit deposition, R&D, Shanghai, domestic equipment supplier, advanced manufacturing, electronics components, deep tech, Series C, venture capital